To expand the types of materials that researchers can process, MIT.nano has acquired a new SAMCO inductively coupled plasma (ICP) reactive-ion etching (RIE) system. The instrument has been installed and qualified on the third floor of MIT.nano, where it is now available for training and use. Reactive-ion etching is a material removal process performed under […]
New plasma etching system significantly expands MIT.nano process capabilities
- Post author:admin
- Post published:July 9, 2021
- Post category:Uncategorized
Tags: Education News
Please Share This Share this content
You Might Also Like
EliveClass.com : An online portal for self Learning of Various Topics Liike English Speaking courses, Yoga Courses, Dance Classes and Computer Courses.
UNPRPD hosts co-design meeting for the development of an Audit Tool to track and document stigma and discrimination
![Read more about the article Penguin Random House: Penguin Random House Announces the “Michelle Obama Award for Memoir”](https://eliveclass.com/wp-content/uploads/2022/10/1200px-Penguin_Random_House.svg_-1-5-300x147.png)